钯溅射靶,

Palladium sputtering target is used for standard scanning electron microscopy (SEM) coating. It is utilized to cover as specimen with a thin layer of conducting material viz. palladium. It is needed to prevent charging of specimen with an electron beam in conventional SEM mode as well as to increase signal to noise ratio.

Typical composition of alloy: Al 95.8-98.6%, Mg 0.8-1.2%, Si 0.4-0.8%, Cr 0.04-0.35%, Cu 0.15-0.4%, Fe 0.7% max, Zn 0.25% max, Mn 0.15% max, Ti 0.15% maxIncompatible with strong acids, halogens, bases and alcohols.

MFCD00011167

231-115-6

Ambient temperatures.

≈154g/target

Insoluble in water.

否